| Titre : |
Caractérisation de films minces déposés par plasma PECVD à partir de vapeurs de TMS |
| Type de document : |
texte imprimé |
| Auteurs : |
Mouloud Kihel ; Univ. de Constantine, Éditeur scientifique ; S. Sahèi, Directeur de thèse |
| Année de publication : |
2006 |
| Importance : |
77 f. |
| Note générale : |
01 Disponible à la salle de recherche 02 Disponibles au magazin de la B.U.C.
01CD |
| Langues : |
Français (fre) |
| Catégories : |
Français - Anglais
Electronique
|
| Tags : |
Vapeur Plasma Films minces PECVD TMS |
| Index. décimale : |
621 Electronique |
| Résumé : |
In this work the study of the effect of the deposition parameters (discharge power and additive oxygen rate in the mixture) on the physico-chemical and dielectric properties of thin films deposited by PECVD technique in microwave DCER plasma reactor from TMS vapors only or mixed with proportions of oxygen has been reported.
The physico-chemical analysis of deposited films show that for the weak rates of oxygen the elaborated layers are organic in nature, whereas, for the strong rates of oxygen the elaborate layers are inorganic in nature and their structure was close to that of the thermal silicon oxide. Moreover, the increase of the power discharge produces a more fragmentation of the TMS molecule and induced a reduction of the methyl and hydrogen groups.
The value of the permittivity varies according to the rate of oxygen in the mixture. For 90% rate of oxygen, the value of the dielectric constant is near to the value found for thermal silicon oxide and the dielectric losses were very low. This results corelate well with FTIR spectroscopy results. It appears that the value of the
permittivity and the dielectric losses is linked to the presence of the hydroxyls elements in the elaboreted films. A more incorporation of the hydroxyls elements lead to the increase of the permittivity and the dielectric losses. The study of the electric current according to the polarisation voltage suggests the presence of space charge mechanism. The addition of the oxygen and the increase of the discharge power lead to an improvement of the electric properties of the deposited films. |
| Diplôme : |
Magistère |
| En ligne : |
../theses/electronique/KIH4497.pdf |
| Permalink : |
index.php?lvl=notice_display&id=2784 |
Caractérisation de films minces déposés par plasma PECVD à partir de vapeurs de TMS [texte imprimé] / Mouloud Kihel ; Univ. de Constantine, Éditeur scientifique ; S. Sahèi, Directeur de thèse . - 2006 . - 77 f. 01 Disponible à la salle de recherche 02 Disponibles au magazin de la B.U.C.
01CD Langues : Français ( fre)
| Catégories : |
Français - Anglais
Electronique
|
| Tags : |
Vapeur Plasma Films minces PECVD TMS |
| Index. décimale : |
621 Electronique |
| Résumé : |
In this work the study of the effect of the deposition parameters (discharge power and additive oxygen rate in the mixture) on the physico-chemical and dielectric properties of thin films deposited by PECVD technique in microwave DCER plasma reactor from TMS vapors only or mixed with proportions of oxygen has been reported.
The physico-chemical analysis of deposited films show that for the weak rates of oxygen the elaborated layers are organic in nature, whereas, for the strong rates of oxygen the elaborate layers are inorganic in nature and their structure was close to that of the thermal silicon oxide. Moreover, the increase of the power discharge produces a more fragmentation of the TMS molecule and induced a reduction of the methyl and hydrogen groups.
The value of the permittivity varies according to the rate of oxygen in the mixture. For 90% rate of oxygen, the value of the dielectric constant is near to the value found for thermal silicon oxide and the dielectric losses were very low. This results corelate well with FTIR spectroscopy results. It appears that the value of the
permittivity and the dielectric losses is linked to the presence of the hydroxyls elements in the elaboreted films. A more incorporation of the hydroxyls elements lead to the increase of the permittivity and the dielectric losses. The study of the electric current according to the polarisation voltage suggests the presence of space charge mechanism. The addition of the oxygen and the increase of the discharge power lead to an improvement of the electric properties of the deposited films. |
| Diplôme : |
Magistère |
| En ligne : |
../theses/electronique/KIH4497.pdf |
| Permalink : |
index.php?lvl=notice_display&id=2784 |
|
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