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Titre : Caractérisation de films minces déposés par plasma PECVD à partir de vapeurs de TMS Type de document : texte imprimé Auteurs : Mouloud Kihel ; Univ. de Constantine, Éditeur scientifique ; S. Sahèi, Directeur de thèse Année de publication : 2006 Importance : 77 f. Note générale : 01 Disponible à la salle de recherche 02 Disponibles au magazin de la B.U.C.
01CDLangues : Français (fre) Catégories : Français - Anglais
ElectroniqueTags : Vapeur Plasma Films minces PECVD TMS Index. décimale : 621 Electronique Résumé : In this work the study of the effect of the deposition parameters (discharge power and additive oxygen rate in the mixture) on the physico-chemical and dielectric properties of thin films deposited by PECVD technique in microwave DCER plasma reactor from TMS vapors only or mixed with proportions of oxygen has been reported.
The physico-chemical analysis of deposited films show that for the weak rates of oxygen the elaborated layers are organic in nature, whereas, for the strong rates of oxygen the elaborate layers are inorganic in nature and their structure was close to that of the thermal silicon oxide. Moreover, the increase of the power discharge produces a more fragmentation of the TMS molecule and induced a reduction of the methyl and hydrogen groups.
The value of the permittivity varies according to the rate of oxygen in the mixture. For 90% rate of oxygen, the value of the dielectric constant is near to the value found for thermal silicon oxide and the dielectric losses were very low. This results corelate well with FTIR spectroscopy results. It appears that the value of the
permittivity and the dielectric losses is linked to the presence of the hydroxyls elements in the elaboreted films. A more incorporation of the hydroxyls elements lead to the increase of the permittivity and the dielectric losses. The study of the electric current according to the polarisation voltage suggests the presence of space charge mechanism. The addition of the oxygen and the increase of the discharge power lead to an improvement of the electric properties of the deposited films.Diplôme : Magistère En ligne : ../theses/electronique/KIH4497.pdf Permalink : index.php?lvl=notice_display&id=2784 Caractérisation de films minces déposés par plasma PECVD à partir de vapeurs de TMS [texte imprimé] / Mouloud Kihel ; Univ. de Constantine, Éditeur scientifique ; S. Sahèi, Directeur de thèse . - 2006 . - 77 f.
01 Disponible à la salle de recherche 02 Disponibles au magazin de la B.U.C.
01CD
Langues : Français (fre)
Catégories : Français - Anglais
ElectroniqueTags : Vapeur Plasma Films minces PECVD TMS Index. décimale : 621 Electronique Résumé : In this work the study of the effect of the deposition parameters (discharge power and additive oxygen rate in the mixture) on the physico-chemical and dielectric properties of thin films deposited by PECVD technique in microwave DCER plasma reactor from TMS vapors only or mixed with proportions of oxygen has been reported.
The physico-chemical analysis of deposited films show that for the weak rates of oxygen the elaborated layers are organic in nature, whereas, for the strong rates of oxygen the elaborate layers are inorganic in nature and their structure was close to that of the thermal silicon oxide. Moreover, the increase of the power discharge produces a more fragmentation of the TMS molecule and induced a reduction of the methyl and hydrogen groups.
The value of the permittivity varies according to the rate of oxygen in the mixture. For 90% rate of oxygen, the value of the dielectric constant is near to the value found for thermal silicon oxide and the dielectric losses were very low. This results corelate well with FTIR spectroscopy results. It appears that the value of the
permittivity and the dielectric losses is linked to the presence of the hydroxyls elements in the elaboreted films. A more incorporation of the hydroxyls elements lead to the increase of the permittivity and the dielectric losses. The study of the electric current according to the polarisation voltage suggests the presence of space charge mechanism. The addition of the oxygen and the increase of the discharge power lead to an improvement of the electric properties of the deposited films.Diplôme : Magistère En ligne : ../theses/electronique/KIH4497.pdf Permalink : index.php?lvl=notice_display&id=2784 Exemplaires (1)
Code-barres Cote Support Localisation Section Disponibilité KIH/4497 KIH/4497 Thèse Bibliothèque principale Thèses Disponible Caractérisation des couches minces du silicium amorphe hydrogéné cristalisées par le laser excimère KrF / Nassima Bouteffah (Née Bouhdjar)
Titre : Caractérisation des couches minces du silicium amorphe hydrogéné cristalisées par le laser excimère KrF Type de document : texte imprimé Auteurs : Nassima Bouteffah (Née Bouhdjar) ; Univ. de Constantine, Éditeur scientifique ; K. Mirouh, Directeur de thèse Année de publication : 2005 Importance : 72 f. Note générale : 01 Disponible à la salle de recherche 02 Disponibles au magazin de la bibliothèque centrale Langues : Français (fre) Catégories : Français - Anglais
PhysiqueTags : Couches minces LPCVD PECVD Silicium amorphe hydrogéné Diffraction X Spectroscopie Raman Spectroscopie infrarouge APCVD Laser excimère Phases métastables Index. décimale : 530 Physique Permalink : index.php?lvl=notice_display&id=3337 Caractérisation des couches minces du silicium amorphe hydrogéné cristalisées par le laser excimère KrF [texte imprimé] / Nassima Bouteffah (Née Bouhdjar) ; Univ. de Constantine, Éditeur scientifique ; K. Mirouh, Directeur de thèse . - 2005 . - 72 f.
01 Disponible à la salle de recherche 02 Disponibles au magazin de la bibliothèque centrale
Langues : Français (fre)
Catégories : Français - Anglais
PhysiqueTags : Couches minces LPCVD PECVD Silicium amorphe hydrogéné Diffraction X Spectroscopie Raman Spectroscopie infrarouge APCVD Laser excimère Phases métastables Index. décimale : 530 Physique Permalink : index.php?lvl=notice_display&id=3337 Exemplaires (1)
Code-barres Cote Support Localisation Section Disponibilité BOU/4262 BOU/4262 Thèse Bibliothèque principale Thèses Disponible
Titre : Elaboration de nouvelles phases de silicium en couches minces Type de document : texte imprimé Auteurs : Amira Khaled, Auteur ; K Mirouh, Directeur de thèse Editeur : Constantine : Université Mentouri Constantine Année de publication : 2008 Importance : 85 f. Format : 31 cm Note générale : Magister
2 copies imprimées disponiblesLangues : Français (fre) Catégories : Français - Anglais
PhysiqueTags : les couches minces LPCVD PECVD la diffraction des rayons X la micro- Spectroscopie Raman micro-indentation les transformations de phases. Physique Index. décimale : 530 Physique En ligne : ../theses/physique/KHA5951.pdf Format de la ressource électronique : Permalink : index.php?lvl=notice_display&id=5827 Elaboration de nouvelles phases de silicium en couches minces [texte imprimé] / Amira Khaled, Auteur ; K Mirouh, Directeur de thèse . - Constantine : Université Mentouri Constantine, 2008 . - 85 f. ; 31 cm.
Magister
2 copies imprimées disponibles
Langues : Français (fre)
Catégories : Français - Anglais
PhysiqueTags : les couches minces LPCVD PECVD la diffraction des rayons X la micro- Spectroscopie Raman micro-indentation les transformations de phases. Physique Index. décimale : 530 Physique En ligne : ../theses/physique/KHA5951.pdf Format de la ressource électronique : Permalink : index.php?lvl=notice_display&id=5827 Exemplaires (1)
Code-barres Cote Support Localisation Section Disponibilité KHA/5951 KHA/5951 Thèse Bibliothèque principale Thèses Disponible 
Titre : Etude de l’effet de la composition d’une couche mince et de ses conditions d’élaboration par plasma froid à partir de vapeurs organosiliciées sur les propriétés de surface d’un film polymérique Type de document : texte imprimé Auteurs : Abdelouahab Nouicer Ilyès dit, Auteur ; Salah Sahli, Directeur de thèse Editeur : جامعة الإخوة منتوري قسنطينة Année de publication : 2017 Importance : 159 f. Format : 30 cm. Note générale : 2 copies imprimées disponibles
Langues : Français (fre) Catégories : Français - Anglais
ElectroniqueTags : HMDSO Polyimide traitement de surface mouillabilité super-hydrophobie nanopoudre PECVD RCER FTIR MEB AFM surface treatment wettability super-hydrophobic nanopowder SEM البولیمید معالجة السطح البلل المساحیق النانومتریة Index. décimale : 621 Electronique Résumé : Plasma polymerization of hexamethyldisiloxane (PPHMDSO) was used to deposit SiOxCyHz thin films on silicon and polyimide substrates, using low-frequency plasma and microwave plasma discharge at low pressure. The effects of plasma chamber pressure, oxygen rate in Ar/O2 mixture, treatment time and post-treatment on the films characteristics were studied.
The thickness, surface properties and chemical structure of the deposited thin films were analyzed using profilo-meter measurements, scanning electron microscopy (SEM), static contact angle and infrared spectroscopy (FTIR and FTIR-ATR). At low frequencies and for certain deposition parameters, nano-powders of different concentrations and sizes were
observed on the deposited thin films surface. The FTIR analysis revealed that the chemical formula of the deposited layers is close to SiOxCyHz one, with more organic character when chamber pressure and/or deposition time were increased. Water contact angle measurements show that the increase in the deposition pressure and deposition time leads to the growth on
the polyimide and silicon substrates of thin layers with super-hydrophobic surface due to the increase in the concentration of the nano-powders on the treated surfaces. Plasmas created in HMDSO vapours using a microwave frequency plasma in ECR reactor leads to the deposition of similar PPHMDSO thin layer on polyimide and silicon surfaces. A post-treatment of these
coating layers using a microwave plasma created in Ar/O2 mixtures shows that the increase of oxygen rate in this mixture and the increase in the post-treatment time induces a significant decrease of the contact angle because of a decrease in the layers roughness (revealed by AFM characterization) and mainly, because of a more surface oxidation of the thin layers (revealed by FTIR analyzes)
Diplôme : Doctorat en sciences En ligne : ../theses/electronique/NOU7147.pdf Format de la ressource électronique : Permalink : index.php?lvl=notice_display&id=10456 Etude de l’effet de la composition d’une couche mince et de ses conditions d’élaboration par plasma froid à partir de vapeurs organosiliciées sur les propriétés de surface d’un film polymérique [texte imprimé] / Abdelouahab Nouicer Ilyès dit, Auteur ; Salah Sahli, Directeur de thèse . - جامعة الإخوة منتوري قسنطينة, 2017 . - 159 f. ; 30 cm.
2 copies imprimées disponibles
Langues : Français (fre)
Catégories : Français - Anglais
ElectroniqueTags : HMDSO Polyimide traitement de surface mouillabilité super-hydrophobie nanopoudre PECVD RCER FTIR MEB AFM surface treatment wettability super-hydrophobic nanopowder SEM البولیمید معالجة السطح البلل المساحیق النانومتریة Index. décimale : 621 Electronique Résumé : Plasma polymerization of hexamethyldisiloxane (PPHMDSO) was used to deposit SiOxCyHz thin films on silicon and polyimide substrates, using low-frequency plasma and microwave plasma discharge at low pressure. The effects of plasma chamber pressure, oxygen rate in Ar/O2 mixture, treatment time and post-treatment on the films characteristics were studied.
The thickness, surface properties and chemical structure of the deposited thin films were analyzed using profilo-meter measurements, scanning electron microscopy (SEM), static contact angle and infrared spectroscopy (FTIR and FTIR-ATR). At low frequencies and for certain deposition parameters, nano-powders of different concentrations and sizes were
observed on the deposited thin films surface. The FTIR analysis revealed that the chemical formula of the deposited layers is close to SiOxCyHz one, with more organic character when chamber pressure and/or deposition time were increased. Water contact angle measurements show that the increase in the deposition pressure and deposition time leads to the growth on
the polyimide and silicon substrates of thin layers with super-hydrophobic surface due to the increase in the concentration of the nano-powders on the treated surfaces. Plasmas created in HMDSO vapours using a microwave frequency plasma in ECR reactor leads to the deposition of similar PPHMDSO thin layer on polyimide and silicon surfaces. A post-treatment of these
coating layers using a microwave plasma created in Ar/O2 mixtures shows that the increase of oxygen rate in this mixture and the increase in the post-treatment time induces a significant decrease of the contact angle because of a decrease in the layers roughness (revealed by AFM characterization) and mainly, because of a more surface oxidation of the thin layers (revealed by FTIR analyzes)
Diplôme : Doctorat en sciences En ligne : ../theses/electronique/NOU7147.pdf Format de la ressource électronique : Permalink : index.php?lvl=notice_display&id=10456 Exemplaires (1)
Code-barres Cote Support Localisation Section Disponibilité NOU/7147 NOU/7147 Thèse Bibliothèque principale Thèses Disponible
Titre : Etude de la formation de poudres par plasmas basse pression à partir de vapeurs d’hexamethyldisiloxane et à partir de méthane. Type de document : texte imprimé Auteurs : Youcef Fermi, Auteur ; Salah Sahli, Directeur de thèse ; Khaled Hassouni, Directeur de thèse Mention d'édition : 22 décembre 2021 Editeur : جامعة الإخوة منتوري قسنطينة Année de publication : 2021 Importance : 150 f. Format : 30 cm. Note générale : Doctorat 3éme CYCLE LMD.
1 copies imprimées disponibles
Langues : Français (fre) Catégories : Français - Anglais
ElectroniqueTags : Electronique :Micro-Nanoélectronique et Photonique Plasmas basse pression Poudres PECVD HMDSO Nanoparticules Torche CH4 nanodiamant Low pressure plasmas Powders nanodiamond بلازما الضغط المنخفض المساحيق الترسيب الكيميائي للغاز المحسن بالبلازما سداسي ميثيل ثنائي أكسيد السليسيوم الجسيمات النانوية الشعلة الميثان الماس النانوي Index. décimale : 621 Electronique Résumé :
This work is concerned with the study of powders created in low pressure plasma in hexamethyldisiloxane vapors and the study of powders created by plasma torch from a mixture of CH4 / H2. The formation of powders in the gas phase of the HMDSO vapors was detected by monitoring the electrical signal delivered by the plasma generator that we carried out and by studying the luminescence of the plasma by optical emission spectroscopy. This latest diagnostic technique has shown that the evolution of emission intensities of Si-O and Si-H species is related to the formation of powders. The SEM observations of the deposits made, showed the presence of powders on the substrates, the size and shape of which depend on the deposit parameters. Analysis of thin layers produced by FTIR spectroscopy and EDX microanalysis of powders have shown that the latter are of the SiOxCy: H type. We have developed a new way to synthesize at room temperature, starting from a methane / hydrogen mixture, powders rich in nanodiamond particles using a microwave plasma microtroche that we have produced locally. The gas phase of the micro-torch plasma was characterized by high-resolution optical emission spectroscopy and determined the gas temperature as well as the electron density of the micro-torch plasma. The morphology, structure and composition of the nanoparticles that we deposited by this method were made by SEM and TEM microscopy, by Raman spectroscopy and EELS. These characterization techniques have clearly
confirmed the presence of nanodiamond for certain deposition conditions.
Diplôme : Doctorat En ligne : ../theses/electronique/FER7846.pdf Format de la ressource électronique : Permalink : index.php?lvl=notice_display&id=11749 Etude de la formation de poudres par plasmas basse pression à partir de vapeurs d’hexamethyldisiloxane et à partir de méthane. [texte imprimé] / Youcef Fermi, Auteur ; Salah Sahli, Directeur de thèse ; Khaled Hassouni, Directeur de thèse . - 22 décembre 2021 . - جامعة الإخوة منتوري قسنطينة, 2021 . - 150 f. ; 30 cm.
Doctorat 3éme CYCLE LMD.
1 copies imprimées disponibles
Langues : Français (fre)
Catégories : Français - Anglais
ElectroniqueTags : Electronique :Micro-Nanoélectronique et Photonique Plasmas basse pression Poudres PECVD HMDSO Nanoparticules Torche CH4 nanodiamant Low pressure plasmas Powders nanodiamond بلازما الضغط المنخفض المساحيق الترسيب الكيميائي للغاز المحسن بالبلازما سداسي ميثيل ثنائي أكسيد السليسيوم الجسيمات النانوية الشعلة الميثان الماس النانوي Index. décimale : 621 Electronique Résumé :
This work is concerned with the study of powders created in low pressure plasma in hexamethyldisiloxane vapors and the study of powders created by plasma torch from a mixture of CH4 / H2. The formation of powders in the gas phase of the HMDSO vapors was detected by monitoring the electrical signal delivered by the plasma generator that we carried out and by studying the luminescence of the plasma by optical emission spectroscopy. This latest diagnostic technique has shown that the evolution of emission intensities of Si-O and Si-H species is related to the formation of powders. The SEM observations of the deposits made, showed the presence of powders on the substrates, the size and shape of which depend on the deposit parameters. Analysis of thin layers produced by FTIR spectroscopy and EDX microanalysis of powders have shown that the latter are of the SiOxCy: H type. We have developed a new way to synthesize at room temperature, starting from a methane / hydrogen mixture, powders rich in nanodiamond particles using a microwave plasma microtroche that we have produced locally. The gas phase of the micro-torch plasma was characterized by high-resolution optical emission spectroscopy and determined the gas temperature as well as the electron density of the micro-torch plasma. The morphology, structure and composition of the nanoparticles that we deposited by this method were made by SEM and TEM microscopy, by Raman spectroscopy and EELS. These characterization techniques have clearly
confirmed the presence of nanodiamond for certain deposition conditions.
Diplôme : Doctorat En ligne : ../theses/electronique/FER7846.pdf Format de la ressource électronique : Permalink : index.php?lvl=notice_display&id=11749 Exemplaires (1)
Code-barres Cote Support Localisation Section Disponibilité FER/7846 FER/7846 Thèse Bibliothèque principale Thèses Disponible
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